PVD二硫化鉬潤(rùn)滑減摩處理

性能優(yōu)勢(shì)
·coating deposition carried out using a high density of low energy bombarding ions.
使用高密度低能量轟擊離子進(jìn)行沉積鍍膜。
·deposition of very dense, non-columnar coating structures with low internal stresses.
鍍層致密度好，低柱狀晶結(jié)構(gòu)，內(nèi)應(yīng)力低
·deposition of coatings with dense structures at low temperatures.
• 可在低溫環(huán)境下沉積致密結(jié)構(gòu)的鍍層
·high efficiency of ion cleaning resulting in coatings with the highest levels of adhesion.
高效率等離子清理以提供高的鍍層結(jié)合強(qiáng)度。
·coatings quality is assured by the use of specially designed plasmagsputter sources, which create an intense plasma and high ion bombardment of work pieces.
鍍層品質(zhì)保證是由使用專(zhuān)門(mén)設(shè)計(jì)plasmag濺射源及提供高密度的等離子。